Optical system and method for the production of...

Photocopying – Projection printing and copying cameras – Focus or magnification control

Reexamination Certificate

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C250S330000, C359S494010

Reexamination Certificate

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07317508

ABSTRACT:
An optical system of a microlithographic exposure apparatus comprises at least one optical element (L1to L16, 15, 16, 24) having a locally varying birefringence direction distribution that is caused by stress-induced birefringence and is at least substantially rotationally symmetrical. At least one birefringent correcting element (K1, K2; K′) is made of a crystal having a location independent birefringence direction distribution that is at least substantially rotationally symmetrical. The crystal has a crystal lattice orientation that is oriented such that its birefringence direction distribution is at least substantially perpendicular to the locally varying birefringence direction distribution of the at least one optical element (L1to L16, 15, 16, 24).

REFERENCES:
patent: 5986733 (1999-11-01), Winker et al.
patent: 6785051 (2004-08-01), Allan et al.
patent: 2003/0011896 (2003-01-01), Shiraishi
patent: 2003/0168597 (2003-09-01), Webb et al.
patent: 2004/0105170 (2004-06-01), Krahmer et al.
patent: WO 02/093209 (2002-11-01), None
patent: WO 02/099500 (2002-12-01), None
patent: WO 03/046634 (2003-05-01), None

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