Optical reflectance method for determining the surface roughness

Details Optical reflectance method for determining the surface roughness Optical reflectance method for determining the surface roughness

1983-03-28

1985-04-16

Smith, Alfred E.

Radiant energy

Invisible radiant energy responsive electric signalling

Ultraviolet light responsive means

2503581, 356371, G01N 2157

Patent

active

045118000

ABSTRACT:
This disclosure describes an optical reflectance method for rapid and simultaneous determination of surface roughness and structure of silicon films deposited by chemical vapor deposition. The magnitude of the reflectance of polycrystalline silicon films at a wavelength of about 280 nm can be used directly as a quantitative measure of film surface roughness. The magnitude of the reflectance of as-deposited amorphous or mixed amorphous-polycrystalline silicon films at a wavelength of about 400 nm can be used as a measure of the combined surface roughness and amorphism of the films. Other materials such as metals, alloys and silicides used in semiconductor technology may be evaluated with respect to surface roughness in a similar manner.

REFERENCES:
patent: 4290698 (1981-09-01), Milana

Affiliated with

Also associated with

Rating

Optical reflectance method for determining the surface roughness does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Optical reflectance method for determining the surface roughness, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optical reflectance method for determining the surface roughness will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1458316