Optical: systems and elements – Lens – With reflecting element
Reexamination Certificate
2006-04-18
2006-04-18
Ben, Loha (Department: 2873)
Optical: systems and elements
Lens
With reflecting element
C359S726000, C359S483010, C359S485050, C359S494010, C359S490020, C359S490020
Reexamination Certificate
active
07031077
ABSTRACT:
An optical reduction system for use in the photolithographic manufacture of semiconductor devices having one or more quarter-wave plates operating near the long conjugate end. A quarter-wave plate after the reticle provides linearly polarized light at or near the beamsplitter. A quarter-wave plate before the reticle provides circularly polarized or generally unpolarized light at or near the reticle. Additional quarter-wave plates are used to further reduce transmission loss and asymmetries from feature orientation. The optical reduction system provides a relatively high numerical aperture of 0.7 capable of patterning features smaller than 0.25 microns over a 26 mm×5 mm field. The optical reduction system is thereby well adapted to a step and scan microlithographic exposure tool as used in semiconductor manufacturing. Several other embodiments combine elements of different refracting power to widen the spectral bandwidth which can be achieved.
REFERENCES:
patent: 4953960 (1990-09-01), Williamson
patent: 5442184 (1995-08-01), Palmer et al.
patent: 5537260 (1996-07-01), Williamson
patent: 5539567 (1996-07-01), Lin et al.
patent: 5539568 (1996-07-01), Lin et al.
patent: 6081382 (2000-06-01), Omura
patent: 6157498 (2000-12-01), Takahashi
patent: 6208473 (2001-03-01), Omura
patent: 6229647 (2001-05-01), Takahashi et al.
patent: 6362926 (2002-03-01), Omura et al.
patent: 6392800 (2002-05-01), Schuster
patent: 6522483 (2003-02-01), Kreuzer
patent: 6680798 (2004-01-01), Kreuzer
patent: 6836380 (2004-12-01), Kreuzer
patent: 0 823 662 (1998-02-01), None
D. G. Flagello and A.E. Rosenbluth, “Lithographic Tolerances Based on Vector Diffraction Theory,” J. Vac. Sci. Technol. B 10(5), Nov./Dec. 1992, pp. 2997-3003.
D.G. Flagello et al., “Understanding High Numerical Aperture Optical Lithography,” Microelectronic Engineering 17, 1992, pp. 105-108.
Copy of International Search Report Application No. PCT/US01/13139, issued Sep. 21, 2001, 4 pages.
ASML Holding N.V.
Ben Loha
Sterne Kessler Goldstein & Fox P.L.L.C.
LandOfFree
Optical reduction method with elimination of reticle... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Optical reduction method with elimination of reticle..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optical reduction method with elimination of reticle... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3589520