Optical recording medium with phase transition layer and...

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Reexamination Certificate

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C428S064400, C428S064500, C430S270130

Reexamination Certificate

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06998162

ABSTRACT:
An optical recording medium having a phase transition material film and a method of manufacturing the optical recording medium are provided. In the method, first, a phase transition material film, a sacrificial film, and a metal film are sequentially stacked on a substrate. Next, the metal film is anodized to form a metal oxide film having a plurality of holes, and portions of the sacrificial film exposed through the holes are anode-oxidized to form oxide films. Thereafter, the phase transition material film is patterned by removing the metal oxide film and by etching the sacrificial film and the phase transition material film using the oxide films as a mask. Then, the oxide films are removed from the sacrificial film, and an upper insulation film, a reflection film, and a protection film are deposited on the upper surface of the patterned phase transition material film. The optical recording medium can be simply manufactured by using a self-alignment method and can have a highly-integrated large-capacity memory.

REFERENCES:
patent: 5368986 (1994-11-01), Terao et al.
patent: 5747180 (1998-05-01), Miller et al.
patent: 5789055 (1998-08-01), Yoon
patent: 5906874 (1999-05-01), Takahashi et al.
patent: 6197399 (2001-03-01), Naito et al.
patent: 2004/0028869 (2004-02-01), Terao et al.
patent: 1 058 247 (2000-12-01), None
patent: 7311984 (1995-11-01), None
Notice to Submit Response issued by the Korean Patent Office in corresponding application 10-2002-0071610 on Jun. 18, 2004.

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