Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1990-04-24
1991-09-24
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430495, 430945, 3461351, 365119, G11C 1304, G03C 173
Patent
active
050513370
ABSTRACT:
Disclosed is an optical recording material comprising a porphine derivative having at least an ionic group and a polymer compatible with this porphine derivative. As the porphine derivative, there are used a porphine derivative having an N-alkylpyridinium group, such as 5,10,5,20-tetra(4-N-methylpyridinium) porphine, a porphine derivative having a quaternary amino group, such as 5,10,15,20-tetra(4-N,N,N-trimethylaminophenyl) porphine, a porphine derivative having a sulfonatophenyl group, such as 5,10,15,20-tetra (4-sulfonatophenyl) porphine, and a porphine derivative having a carbonatophenyl group, such as 5,10,15,20-tetra-(4-carbonatophenyl) porphine. Either an organic polymer or an inorganic polymer is used as the polymer. From the viewpoint of the recording stability, a water-soluble polymer such as polyvinyl alcohol or sodium polystyrene sulfonate is preferred as the organic polymer. Silica glass synthesized by using tetramethoxysilane or tetraethoxysilane as the starting material is used as the inorganic polymer.
In the optical recording material, a thermally stable hole can be formed at a temperature higher than the liquid helium temperature, and therefore, attenuation of the formed holes after elevation of the temperature is small and the recording stability is high. Moreover, a formation of hole at the liquid nitrogen temperature can be carried out.
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S. Volker et al.: IBM J. Res Development, vol. 23, No. 5, Sep. 1979, pp. 547-555.
S. Volker et al.: The Journal of Chemical Physics, vol. 67, No. 4 (Aug. 15, 1977) pp. 1759-1765.
A. R. Gutierrez et al.: IBM J.Res Develop., vol. 26, No. 2, Mar. 1982, pp. 198-208.
Iwamoto Masao
Kominami Kazuhiko
Sakoda Kazuaki
Bowers Jr. Charles L.
Buscher Mark R.
Director--General of Agency of Industrial Science and Technology
Miller Austin R.
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