OPTICAL PROXIMITY EFFECT CORRECTING METHOD AND MASK DATA...

Details OPTICAL PROXIMITY EFFECT CORRECTING METHOD AND MASK DATA... OPTICAL PROXIMITY EFFECT CORRECTING METHOD AND MASK DATA...

2006-06-06

2006-06-06

Whitmore, Stacy (Department: 2812)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C430S005000

Reexamination Certificate

active

07058923

ABSTRACT:
An optical proximity effect correcting method in a semiconductor manufacturing process includes adding, detecting, judging, and deleting. The adding includes adding a first correcting region around a portion of a first design pattern. The portion faces a second design pattern. A first corrected design pattern includes the first correcting region and the first design pattern. The detecting includes detecting a space between the first corrected design pattern and the second design pattern. The judging includes judging whether the space is smaller than or equal to a predetermined value. The deleting includes deleting at least a portion of the first correcting region such that the space is larger than the predetermined value, when the space is smaller than or equal to the predetermined value.

REFERENCES:
patent: 5994009 (1999-11-01), Tzu et al.
patent: 6214494 (2001-04-01), Bula et al.
patent: 6289499 (2001-09-01), Rieger et al.
patent: 6425117 (2002-07-01), Pasch et al.
patent: 6470489 (2002-10-01), Chang et al.
patent: 6519759 (2003-02-01), Tounai
patent: 6570174 (2003-05-01), Tounai et al.
patent: 9-127677 (1997-05-01), None
patent: 9-292701 (1997-11-01), None
patent: 10-148928 (1998-06-01), None
patent: 10-189409 (1998-07-01), None
patent: 10-069058 (1998-10-01), None
patent: 10-289861 (1998-10-01), None

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