Optical proximity correction system

Details Optical proximity correction system Optical proximity correction system

1999-01-29

2000-06-20

Lintz, Paul R.

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

430 30, G06F 1750

Patent

active

060773103

ABSTRACT:
Pattern data that is an object of correction is divided into an area on which correction is made using correction values that have been obtained in advance for patterns and their respective layouts and an area on which correction is made on the basis of correction values calculated by a simulator. For example, simulation-based correction is made on a gate layer in a memory, while rule-based correction is made on a gate layer in the other area than the memory on the basis of rules for active gate width only. After being subjected to the correction, the areas are combined.

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