Optical proximity correction performed with respect to...

Details Optical proximity correction performed with respect to... Optical proximity correction performed with respect to...

2006-02-21

2009-12-08

Whitmore, Stacy A (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C430S005000, C430S030000, C382S144000, C382S145000

Reexamination Certificate

active

07631288

ABSTRACT:
A method of performing optical proximity effect correction includes defining a partial area of an entire area of a mask pattern, the mask pattern including a real pattern and a dummy pattern, and performing optical proximity effect correction only with respect to the partial area.

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