Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-12-20
2005-12-20
Smith, Matthew (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000
Reexamination Certificate
active
06978438
ABSTRACT:
A method and associated computer program for making optical proximity corrections for a reticle layout topology. Edge segments of the reticle layout topology are manipulated to generate a corrected reticle layout accounting for optical distortions and, based on the corrected reticle layout, a plurality of individual figure of merit values are generated. A generalized figure of merit (GFOM) using the plurality of individual figure of merit values is then generated.
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Advanced Micro Devices , Inc.
Levin Naum
Renner , Otto, Boisselle & Sklar, LLP
Smith Matthew
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