Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2006-04-11
2006-04-11
Huff, Mark F. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S005000, C430S311000, C430S396000
Reexamination Certificate
active
07026081
ABSTRACT:
A photolithography mask for optically transferring a pattern formed in the mask onto a substrate and for negating optical proximity effects. The mask includes a plurality of resolvable features to be printed on the substrate, and at least one non-resolvable optical proximity correction feature, where the non-resolvable optical proximity correction feature is a phase-edge.
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Broeke Douglas Van Den
Chen J. Fung
ASML Masktools B.V.
Huff Mark F.
McDermott Will & Emery LLP
Mohamedulla Saleha
LandOfFree
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