Optical proximity correction method utilizing gray bars as...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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Details

C355S053000, C355S030000, C430S005000

Reexamination Certificate

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06934010

ABSTRACT:
A photolithography mask for optically transferring a pattern formed in the mask onto a substrate and for negating optical proximity effects. The mask includes a plurality of resolvable features to be printed on the substrate, and at least one non-resolvable optical proximity correction feature disposed between two of the resolvable features to be printed, where the non-resolvable optical proximity correction feature has a transmission coefficient in the range of greater than 0% to less than 100%.

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“Nakaos et al.”, “A Novel RET for Random Pattern Formation Utilizing Attenuating Non-Phase-Shift Assist Pattern”, pp. 44, 45, 2000, Tokyo, Japan XP010513500.

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