Photocopying – Projection printing and copying cameras – Illumination systems or details
Reexamination Certificate
2005-08-23
2005-08-23
Kim, Peter B. (Department: 2851)
Photocopying
Projection printing and copying cameras
Illumination systems or details
C355S053000, C355S030000, C430S005000
Reexamination Certificate
active
06934010
ABSTRACT:
A photolithography mask for optically transferring a pattern formed in the mask onto a substrate and for negating optical proximity effects. The mask includes a plurality of resolvable features to be printed on the substrate, and at least one non-resolvable optical proximity correction feature disposed between two of the resolvable features to be printed, where the non-resolvable optical proximity correction feature has a transmission coefficient in the range of greater than 0% to less than 100%.
REFERENCES:
patent: 5229230 (1993-07-01), Kamon
patent: 5229255 (1993-07-01), White
patent: 5242770 (1993-09-01), Chen et al.
patent: 5256505 (1993-10-01), Chen et al.
patent: 5288569 (1994-02-01), Lin
patent: 5324600 (1994-06-01), Jinbo et al.
patent: 5362584 (1994-11-01), Brock et al.
patent: 5424154 (1995-06-01), Borodovsky
patent: 5436095 (1995-07-01), Mizuno et al.
patent: 5447810 (1995-09-01), Chen et al.
patent: 5538815 (1996-07-01), Oi et al.
patent: 5663893 (1997-09-01), Wampler et al.
patent: 5707765 (1998-01-01), Chen
patent: 5723233 (1998-03-01), Garza et al.
patent: 5807649 (1998-09-01), Liebmann et al.
patent: 5821014 (1998-10-01), Chen et al.
patent: 5827623 (1998-10-01), Ishida et al.
patent: 8048647 (2000-04-01), Miyazaki et al.
patent: 6114071 (2000-09-01), Chen et al.
patent: 6458493 (2002-10-01), Bula et al.
patent: 2003/0064298 (2003-04-01), Broeke et al.
patent: 1 152 288 (2001-11-01), None
patent: 1 174 784 (2002-01-01), None
patent: 07064274 (1995-03-01), None
patent: 08188073 (1996-07-01), None
patent: 09-073166 (1997-03-01), None
patent: 10-326009 (1998-12-01), None
patent: 11-084625 (1999-03-01), None
patent: 11143047 (1999-05-01), None
“Nakaos et al.”, “A Novel RET for Random Pattern Formation Utilizing Attenuating Non-Phase-Shift Assist Pattern”, pp. 44, 45, 2000, Tokyo, Japan XP010513500.
ASML Masktools B.V.
Kim Peter B.
McDermott Will & Emery LLP
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