Optical: systems and elements – Lens – With field curvature shaping
Reexamination Certificate
2005-08-16
2005-08-16
Epps, Georgia (Department: 2873)
Optical: systems and elements
Lens
With field curvature shaping
C359S754000, C359S683000
Reexamination Certificate
active
06930837
ABSTRACT:
An optical projection lens system for microlithography comprising in the direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a waist (constriction) with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows the second lens group, wherein at least one lens of the projection lens system which is arranged in front of the waist comprises an aspherical surface.
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Shafer David R.
Ulrich Wilhelm
Carl Zeiss SMT AG
Epps Georgia
Hasan M.
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