Optical projection lens system

Optical: systems and elements – Lens – With field curvature shaping

Reexamination Certificate

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C359S754000, C359S683000

Reexamination Certificate

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06930837

ABSTRACT:
An optical projection lens system for microlithography comprising in the direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a waist (constriction) with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows the second lens group, wherein at least one lens of the projection lens system which is arranged in front of the waist comprises an aspherical surface.

REFERENCES:
patent: 4506958 (1985-03-01), Imai
patent: 5059006 (1991-10-01), Kikuchi et al.
patent: 5260832 (1993-11-01), Togino et al.
patent: 5398064 (1995-03-01), Saka
patent: 5414561 (1995-05-01), Wakimoto et al.
patent: 5623365 (1997-04-01), Kuba
patent: 5636000 (1997-06-01), Ushida et al.
patent: 5696631 (1997-12-01), Hoffman
patent: 5856884 (1999-01-01), Mercado
patent: 5969803 (1999-10-01), Mercado
patent: 5986824 (1999-11-01), Mercado
patent: 5990926 (1999-11-01), Mercado
patent: 6008884 (1999-12-01), Yamaguchi et al.
patent: 6084723 (2000-07-01), Matsuzawa et al.
patent: 6088171 (2000-07-01), Kudo
patent: 6166865 (2000-12-01), Matsuyama
patent: 6185050 (2001-02-01), Ota et al.
patent: 6198576 (2001-03-01), Matsuyama
patent: 6259508 (2001-07-01), Shigematsu
patent: 6259569 (2001-07-01), Kasai
patent: 6349005 (2002-02-01), Schuster et al.
patent: 6377338 (2002-04-01), Suenaga
patent: 6512633 (2003-01-01), Konno et al.
patent: 6538821 (2003-03-01), Takahashi
patent: 6560031 (2003-05-01), Shafer et al.
patent: 6606144 (2003-08-01), Omura
patent: 6674513 (2004-01-01), Omura
patent: 2003/0086183 (2003-05-01), Wagner et al.
patent: 2003/0179356 (2003-09-01), Schuster et al.
patent: 2003/0206282 (2003-11-01), Omura
patent: 2004/0120051 (2004-06-01), Schuster
patent: 0 816 892 (1998-01-01), None
patent: 1 235 092 (2002-08-01), None
patent: 1 237 043 (2002-09-01), None
patent: 1 245 984 (2002-10-01), None
patent: 1088192 (1967-10-01), None
patent: 10-282411 (1998-10-01), None
patent: 10-325922 (1998-12-01), None
patent: 11-006957 (1999-01-01), None
patent: 11-095095 (1999-04-01), None
patent: 11-214293 (1999-08-01), None
Bruning, John H. et al., “Optical Lithography—Thirty years and three orders of magnitude, The evolution of optical lithography tools”,SPIE, vol. 3049, pp. 14-27 (1997).
Buckley, Jere D. et al., “Step and Scan: A systems overview of a new lithography tool”,SPIE, vol. 1088, pp. 424-433 (1989).
Glatzel, E., “New Developments in Photographic Objectives”,Offprint from Optical Instruments and Techniques, Oriel Press, pp. 413-415 (1969).
Glatzel, Erhard, “New Lenses for Microlithography”,SPIE, vol. 237, pp. 310-320 (1980).
Sheats, James R. et al.,Microlithography Science and Technology, pp. 263-270.
Wöltche, Walter, “Optical Systems Design with Reference to the Evolution of the Double Gauss Lens”,SPIE, vol. 237, pp. 202-215 (1980).
Sheats, James R. et al.,Microlithography Science and Technology, pp. 263-270.

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