Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2008-07-01
2008-07-01
DeCady, Albert (Department: 2121)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
Reexamination Certificate
active
11804998
ABSTRACT:
To evaluate the adequacy of a profile model, an initial profile model is selected. The profile model includes profile model parameters to be measured in implementing types of process control to be used in controlling a fabrication process. A measurement of profile model parameters is obtained using a first metrology tool and the profile model. A measurement of the profile model parameters is obtained using a second metrology tool and the profile model. Statistical metric criteria are calculated based on the measurements of the profile model parameters obtained using the first and second metrology tools. When the calculated statistical metric criteria are not within matching requirements, the profile model is revised. When the calculated statistical metric criteria are within matching requirements, the profile model or the revised profile model is stored.
REFERENCES:
patent: 6161054 (2000-12-01), Rosenthal et al.
patent: 6298470 (2001-10-01), Breiner et al.
patent: 6388253 (2002-05-01), Su
patent: 6636843 (2003-10-01), Doddi et al.
patent: 6641746 (2003-11-01), Houge et al.
patent: 6645824 (2003-11-01), Yang et al.
patent: 6721691 (2004-04-01), Bao et al.
patent: 6785638 (2004-08-01), Niu et al.
patent: 6792328 (2004-09-01), Laughery et al.
patent: 6891626 (2005-05-01), Niu et al.
patent: 6943900 (2005-09-01), Niu et al.
patent: 7089075 (2006-08-01), Hasan
patent: 2002/0165636 (2002-11-01), Hasan
patent: 2004/0017574 (2004-01-01), Vuong et al.
patent: 2004/0267397 (2004-12-01), Doddi et al.
Bevington, P. R. et al. (2003). “Least-Squares Fit to a Polynomial”, “Least-Squares Fit To An Arbitrary Function”, “Fitting Composite Curves” Chapter 7, 8, 9In Data Reduction and Error Analysis for the Physical Sciences. 3rd Edition, McGraw-Hill: New York, NY, pp. 116-177.
Bevington, P. R. et al. (2003). “Least-Squares Fit to a Straight Line” Chapter 6In Data Reduction and Error Analysis for the Physical Sciences. 3rd Edition, McGraw-Hill: New York, NY, pp. 98-114.
Haykin, S. (1999).Neural Networks. 2nd edition, M. Horton ed., Prentice Hall: Upper Saddle River, New Jersey, 9 pages (Table of Contents).
Li, L. (1996). “Formulation and comparison of two recursive matrix algorithms for modeling layered diffraction gratings,”Journal of the Optical Society of America A13:1024-1035.
Mandell, J. (Jan. 1984). “Fitting Straight Lines when Both Variables are Subject to Error,”Journal of Quality Technology16(1):1-14.
Engelhard Dan
Ferns Jason
Lane Lawrence
Prager Daniel
DeCady Albert
Morrison & Foerster / LLP
Rapp Chad
Timbre Technologies, Inc.
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