Optical: systems and elements – Diffraction – Using fourier transform spatial filtering
Reexamination Certificate
2011-03-08
2011-03-08
Sample, David R (Department: 1783)
Optical: systems and elements
Diffraction
Using fourier transform spatial filtering
C385S010000, C341S013000, C250S23700G, C356S499000, C356S494000, C356S521000, C033S707000
Reexamination Certificate
active
07903336
ABSTRACT:
A reflective metrological scale has a metal tape substrate and a scale pattern of elongated side-by-side marks surrounded by reflective surface areas of the substrate. Each mark has a furrowed cross section and may have a depth in the range of 0.5 to 2 microns. The central region of each mark may be rippled and darkened to provide an enhanced optical reflection ratio with respect to surrounding surface areas. A manufacturing method includes the repeated steps of (1) creating a scale mark by irradiating the substrate surface at a mark location with overlapped pulses from a laser, each pulse having an energy density of less than about 1 joule per cm2, and (2) changing the relative position of the laser and the substrate by a displacement amount defining a next mark location on the substrate at which a next mark of the scale is to be created.
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Dodson, II Stuart A.
Ehrmann Jonathan S.
Hunter Bradley L.
Mabboux Pierre-Yves
Pelsue Kurt
BainwoodHuang
GSI Group Corporation
Gugliotta Nicole T
Sample David R
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