Optical memory element and manufacturing method thereof

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article

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430 5, 430 22, 430945, G03C 516

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054706947

ABSTRACT:
A method for manufacturing an optical memory element including the steps of disposing a resist film on a substrate, placing a photo-mask carrying a guide groove pattern on the resist film so as to position the photo-mask over a predetermined position of the substrate, forming a guide groove pattern latent image on the resist film, developing the guide groove pattern latent image formed on the resist film, conducting an etching operation through the developed guide groove pattern as to form guide grooves in the substrate, removing the resist film from the substrate, and disposing a recording medium layer on the substrate having the guide grooves formed therein.

REFERENCES:
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patent: 3936301 (1976-02-01), Schneider
patent: 4111698 (1978-09-01), Sato
patent: 4374912 (1983-02-01), Kaneki et al.
patent: 4423137 (1983-12-01), Rester
patent: 4544443 (1985-10-01), Ohta et al.
patent: 4873163 (1989-10-01), Watakabe et al.
patent: 4925776 (1990-05-01), Ohta et al.
English Abstract of Japanese Patent 58-102795 (Pub Jun. 18, 1983).
English Abstract of Japanese Patent 59-102235 (Pub Jun. 13, 1984.

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