Optics: measuring and testing – By light interference – Having wavefront division
Reexamination Certificate
2005-11-14
2008-10-14
Connolly, Patrick J (Department: 2877)
Optics: measuring and testing
By light interference
Having wavefront division
C356S515000, C355S053000
Reexamination Certificate
active
07436521
ABSTRACT:
A measuring apparatus for optical, for example interferometric, measurement of an optical imaging system, imaging of a useful pattern in an imaging operation, including a device for production of radiation information, for example interference information, which is indicative of imaging errors, having a mask structure arrangement which contains a measurement pattern, and a device for detection and evaluation of the interference information which is indicative of imaging errors; also a method for operation of the optical imaging system including imaging error correction. The apparatus further includes a heating irradiation arrangement for radiation heating of the optical imaging system during measurement operation such that the heating effect of the radiation which is applied to the optical imaging system to be measured equals, within a tolerance range which can be predetermined, the heating effect of the radiation which is passed through the useful pattern during imaging operation of the optical imaging system.
REFERENCES:
patent: 5805273 (1998-09-01), Unno
patent: 5888675 (1999-03-01), Moore et al.
patent: 6521877 (2003-02-01), Muller-Rissmann et al.
patent: RE38320 (2003-11-01), Nishi et al.
patent: 2001/0053489 (2001-12-01), Dirksen et al.
patent: 2002/0145717 (2002-10-01), Baselmans et al.
patent: 2005/0264827 (2005-12-01), Schriever et al.
patent: 2006/0044536 (2006-03-01), Ohsaki
patent: 2007/0132972 (2007-06-01), Streefkerk et al.
patent: 2008/0049202 (2008-02-01), Kraehmer
patent: 101 09 929 (2001-11-01), None
patent: 1 231 517 (2002-08-01), None
patent: 1 670 041 (2006-06-01), None
patent: WO 2005/022614 (2005-03-01), None
Nigel R. Farrar et al, “In-Situ Measurement of Lens Aberrations”, Optical Microlithography XIII, SPIE vol. 4000—The International Society for Optical Engineering, pp. 18-29, Mar. 1, 2000.
Emer Wolfgang
Hoch Rainer
Schriever Martin
Wegmann Ulrich
Carl Zeiss SMT AG
Connolly Patrick J
Sughrue & Mion, PLLC
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