Optics: measuring and testing – By polarized light examination – Of surface reflection
Patent
1998-09-15
2000-10-17
Pham, Hoa Q.
Optics: measuring and testing
By polarized light examination
Of surface reflection
3562372, 356381, 250225, G01J 404
Patent
active
061340111
ABSTRACT:
An optical measurement system for evaluating the surface of a substrate or the thickness and optical characteristics of a thin film layer overlying the substrate includes an intensity stabilized light source configured to generate a stabilized light beam, a polarizing element for polarizing the light beam emanating from the light source, and a detection system for measuring the light reflected from the substrate The measurement system includes a polarizing beam-splitter for splitting the light reflected from the substrate into s-polarized light and p-polarized light. The measurement system further includes two optical sensors for separately measuring the amplitude of the s-polarized light and the intensity of the p-polarized light and a third detector for measuring either the phase difference between the s-polarized light and the p-polarized light or the reflection angle of the light reflected from the substrate. A control system analyzes the measured amplitude of the s-polarized light and the p-polarized and either the phase-difference or the reflection angle to determine changes in the topography of substrate or changes in the thickness or optical characteristics of the thin film layer.
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Klein David L.
Vurens Gerard H.
HDI Instrumentation
Pham Hoa Q.
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