Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2005-10-04
2005-10-04
Dastouri, Mehrdad (Department: 2623)
Image analysis
Applications
Manufacturing or product inspection
C356S237400, C348S133000
Reexamination Certificate
active
06952491
ABSTRACT:
A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.
REFERENCES:
patent: 4131365 (1978-12-01), Pryor
patent: 4532650 (1985-07-01), Wihl et al.
patent: 4542404 (1985-09-01), Duschl
patent: 4572662 (1986-02-01), Silverman
patent: 4589140 (1986-05-01), Bishop et al.
patent: 4618938 (1986-10-01), Sandland et al.
patent: 4693608 (1987-09-01), Kitagawa et al.
patent: 4700225 (1987-10-01), Hara et al.
patent: 4764969 (1988-08-01), Ohtombe et al.
patent: 4791586 (1988-12-01), Maeda et al.
patent: 4805123 (1989-02-01), Specht et al.
patent: 4845558 (1989-07-01), Tsai et al.
patent: 4872052 (1989-10-01), Liudzius et al.
patent: 4899219 (1990-02-01), Mount, II
patent: 4926489 (1990-05-01), Danielson et al.
patent: 4972493 (1990-11-01), Chemaly
patent: 4979223 (1990-12-01), Manns et al.
patent: 5051825 (1991-09-01), Cochran et al.
patent: 5103304 (1992-04-01), Turcheck, Jr. et al.
patent: 5133601 (1992-07-01), Cohen et al.
patent: 5159646 (1992-10-01), Kumagai
patent: 5185812 (1993-02-01), Yamashita et al.
patent: 5204910 (1993-04-01), Lebeau
patent: 5249035 (1993-09-01), Yamanaka
patent: 5455870 (1995-10-01), Sepai et al.
patent: 5548326 (1996-08-01), Michael
patent: 5699447 (1997-12-01), Alumot
patent: 5982921 (1999-11-01), Alumot et al.
patent: A-53-138387 (1978-02-01), None
patent: A-55-17443 (1980-02-01), None
patent: 60-245240 (1985-12-01), None
patent: 61-245007 (1986-10-01), None
patent: 62-150142 (1987-07-01), None
patent: 62-173731 (1987-07-01), None
patent: A-63-286752 (1988-11-01), None
patent: A-2-163879 (1990-06-01), None
patent: WO-9120054 (1991-12-01), None
Alumot David
Neumann Gad
Sherman Rivka
Tirosh Ehud
Applied Materials Inc.
Dastouri Mehrdad
Sughrue & Mion, PLLC
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