Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1995-06-07
2000-03-07
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 20419226, 20419227, 20429812, C23C 1434
Patent
active
060335351
ABSTRACT:
The present invention is to provide a method for manufacturing the PCE optical information recording disk under control of not only the crystallization velocity but also the complex index of refraction and thus the reflectance on the disk surface.
The PCE optical information recording disk is suitable to be used under the constant angular velocity (the constant rotational numbers wherein the disk has a characteristic that the crystallization velocity is designed to become faster from inside area of the disk to outside area in the radical direction thereof under control of not only the crystallization velocity but also the complex index of refraction and thus the reflectance on the disk surface.
In the case of mass production and high film formation to be required, the present invention provides an effective method for manufacturing the optical disk by means of sputtering from at least two targets at the same time in a manner that the crystallization velocity is increased in a radial direction from inside area to outside area in the disk.
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Akahira Nobuo
Hayata Hiroshi
Nagata Ken'ichi
Ohno Eiji
Sakaue Yoshitaka
Matsushita Electric - Industrial Co., Ltd.
Nguyen Nam
VerSteeg Steven H.
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