Optical gas concentration detector and method of producing...

Details Optical gas concentration detector and method of producing... Optical gas concentration detector and method of producing...

2007-07-10

2010-10-05

Tran, Binh X (Department: 1713)

Etching a substrate: processes

Etching of semiconductor material to produce an article...

C216S024000, C216S026000, C216S074000

Reexamination Certificate

active

07807061

ABSTRACT:
A method of producing a structure by three-dimensionally processing a flat member includes a preparing, a first forming and a second forming. In the preparing, a substrate is prepared. In the first forming, an etching mask is formed on the substrate. The etching mask has at least two openings, and areas of the two openings are different from each other. In the second forming, at least a part of a three-dimension surface shape of the structure is formed on a surface of the substrate by a dry-etching on the substrate in accordance with the area of the opening of the etching mask.

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Bourouina, T. et al. “The MEMSNAS Process: Microloading Effect for Micromachining 3-D Structures of Nearly All Shapes.” Journal of Microelectromechanical Systems, vol. 13, No. 2, pp. 190-199, Apr. 2004.

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