Optical exposure method and device formed by the method

Details Optical exposure method and device formed by the method Optical exposure method and device formed by the method

1995-05-31

1997-02-18

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378146, H01L 2130

Patent

active

056047797

ABSTRACT:
A transfer magnification correcting method suited for use in scanning exposure by use of synchrotron radiation or the like. In proximity exposure according to the scanning exposure method by use of synchrotron radiation, the magnification in the scanning direction is corrected by relatively moving a wafer and a mask simultaneously with the scanning. Also, the overall correction of the magnification is performed by changing a proximity gap or adjusting the temperature of the mask or the wafer. As a result, it is possible to correct the transfer magnification separately in the vertical and horizontal directions.

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