Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1984-03-29
1985-01-01
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156627, 156643, 156646, 204192E, 204298, 356437, 356222, C23F 100, B44C 122, C03C 1500, C03C 2506
Patent
active
044914997
ABSTRACT:
A method for determining the optimum time at which a plasma etching operation should be terminated. The optical emission intensity (S.sub.1) of the plasma in a narrow band centered about a predetermined spectral line, indicative of the gas phase concentration of a plasma etch product or reactant species. The optical emission intensity (S.sub.2) of the plasma in a wide band centered about the predetermined spectral line, indicative of a background emission signal is also monitored. The intensity (S.sub.1L) of the spectral line is then determined in accordance with the equation S.sub.1L =S.sub.1 -k (.alpha.S.sub.2 -S.sub.1). The etching process is terminated when the monitored signal intensity (S.sub.1L) or its time derivative reaches a predetermined value.
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Jerde Leslie G.
Lory Earl R.
Muething Kevin A.
Tsou Len Y.
AT&T - Technologies, Inc.
Kirk D. J.
Powell William A.
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