Optical element and method for its manufacture as well as...

Details Optical element and method for its manufacture as well as... Optical element and method for its manufacture as well as...

2007-02-06

2007-02-06

Wells, Nikita (Department: 2881)

Coating processes

Optical element produced

C427S160000, C427S402000, C428S212000, C428S213000, C430S396000, C356S445000

Reexamination Certificate

active

10491764

ABSTRACT:
In order to reduce contamination of optical elements which comprise a multilayer system on a substrate, it is proposed that the layer material and/or the layer thickness of at least one layer of the multilayer system are/is selected such that the standing wave which forms during reflection of the irradiated operating wavelength, forms a node of the electrical field intensity (node condition) in the area of the free interface of the multilayer system. Furthermore, a method for determining a design of a multilayer system, as well as a manufacturing process and a lithography apparatus are described.

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