Optical disk manufacturing method

Details Optical disk manufacturing method Optical disk manufacturing method

1987-08-27

1989-06-06

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430312, 430323, 430394, 430945, 369284, 369288, G03C 516

Patent

active

048371300

ABSTRACT:
In an optical disk manufacturing method in which a first photo resist layer, an intermediate resin layer, and a second photo resist layer are formed on a substrate in the stated order, a resin solution which is unsoluble in organic solvent is applied to the first photo resist layer, heated, and hardened to form the intermediate resin layer. Thereby the use of a large, expensive device such as a vacuum deposition device or sputting device is eliminated.

REFERENCES:
patent: 3982943 (1976-09-01), Feng et al.
patent: 4109045 (1978-08-01), Goshima et al.
patent: 4732844 (1988-03-01), Ota et al.
Kaplan et al., "Two and Three-Layer Photoresist Technique", IBM Tech. Disc. Bull. vol. 15, No. 7, Dec. 1972, pp. 2339-1240.

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