Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Reexamination Certificate
2009-11-23
2010-11-23
Huff, Mark F (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
C430S005000
Reexamination Certificate
active
07838204
ABSTRACT:
A large mask with random apertures may be formed by forming a smaller mask (also called a cell mask) with a random pattern of transmissive apertures which is then repeatedly replicated to create the large mask. The random pattern may be created by perturbing the aperture locations by a small amount or the apertures may be randomly placed within the cell mask provided certain criteria are met. Alternatively, a large mask with a random pattern of transmissive apertures may be formed without using a cell mask. This large mask may be used to fabricate diffusers and other devices that do not suffer from the interference, diffraction and other optical effects common in devices having structures that are non-randomly patterned.
REFERENCES:
patent: 6159642 (2000-12-01), Kawano et al.
patent: 6303276 (2001-10-01), Savant et al.
patent: 6859326 (2005-02-01), Sales
patent: 6985196 (2006-01-01), Otake et al.
patent: 7090389 (2006-08-01), Parker et al.
patent: 7220026 (2007-05-01), Ko et al.
patent: 7230764 (2007-06-01), Mullen et al.
patent: 7232250 (2007-06-01), Chuang
patent: 7255981 (2007-08-01), Otake et al.
patent: 7316498 (2008-01-01), Olczak
patent: 7380970 (2008-06-01), Hwang et al.
patent: 7401967 (2008-07-01), Wei et al.
patent: 7473518 (2009-01-01), Kuroda et al.
patent: 7618164 (2009-11-01), Wang et al.
patent: 7670726 (2010-03-01), Lu
patent: 2005/0118516 (2005-06-01), Okumura et al.
patent: 2006/0061869 (2006-03-01), Fadel et al.
patent: 2006/0126185 (2006-06-01), Oh et al.
patent: 2007/0247562 (2007-10-01), Shim et al.
patent: 2007/0263412 (2007-11-01), Lee
patent: 2007/0275215 (2007-11-01), Lu
patent: 2008/0101759 (2008-05-01), Lee
patent: 2009/0067155 (2009-03-01), Olczak et al.
Fouassier, J.P.; Radiation Curing in Polymer Science and Technology, Published in 1993.
Fraser Stewart A
Huff Mark F
LandOfFree
Optical diffusers, photomasks and their methods of fabrication does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Optical diffusers, photomasks and their methods of fabrication, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optical diffusers, photomasks and their methods of fabrication will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4248495