Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2007-09-25
2007-09-25
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192120, C204S192160, C204S192230, C204S192260, C204S298150, C204S298250, C427S127000, C427S128000, C427S131000, C427S249100, C427S255140, C427S255600
Reexamination Certificate
active
10896046
ABSTRACT:
In an optical disk substrate film-formation apparatus which prepared an optical disk by forming a thin film on a substrate, the optical disk substrate is held by a holder section. A contact support surface is provided to the holder section which closely contacts at least a portion of the surface of the optical disk substrate rear to the surface where the think film is formed.
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U.S. Appl. No. 11/302,276, filed Dec. 14, 2005, Deguchi et al.
Aman Yasutomo
Deguchi Hiroshi
Hanaoka Katsunari
Ito Kazunori
Miura Hiroshi
McDonald Rodney G.
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Ricoh & Company, Ltd.
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