Optical device for alignment in a projection exposure apparatus

Details Optical device for alignment in a projection exposure apparatus Optical device for alignment in a projection exposure apparatus

1988-12-20

1989-11-14

Rosenberger, Richard A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

G03B 2752

Patent

active

048803103

ABSTRACT:
An optical device for alignment in a projection exposure apparatus used for the alignment of a mask illuminated by exposure light of a predetermined wavelength and a substrate onto which the image of the pattern of the mask is projected through a projection optical system comprises a first alignment mark provided on the mask, a second alignment mark provided on the substrate, a light source emitting alignment light of the wavelength differing from that of the exposure light to irradiate the first and second alignment marks, a light condensing optical device provided between the mask and the light source for condensing the alignment light at at least two locations on the mask and at a position conjugate with the substrate with respect to the projection optical system under the alignment light, and a device for detecting the relative position of the two marks on the basis of optical information from the first and second alignment marks.

REFERENCES:
patent: 4437758 (1981-03-01), Suzuki
patent: 4725737 (1988-02-01), Nakota et al.

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