Optical CVD method with a strong optical intensity used during a

Details Optical CVD method with a strong optical intensity used during a Optical CVD method with a strong optical intensity used during a

1986-07-16

1987-12-08

Newsome, John H.

Coating processes

Measuring, testing, or indicating

Thickness or uniformity of thickness determined

118 501, 118620, 118666, 427 531, 427 541, B05D 306

Patent

active

047117907

ABSTRACT:
In an optical system (19) of an optical CVD device, a variable optical attenuator (25) for a pulsed optical beam is controlled in two steps by a control unit (28) to make the optical beam have an optical intensity at a predetermined area of a substrate (11) in a first intensity range and then in a second intensity range which is an intensity range ordinarily used in depositing a CVD film on the predetermined area. The first intensity range should be very high to clean the substrate at the predetermined area without damages to the substrate. When the CVD film should be deposited to a thickness of one micron or thicker, the optical intensity is preferably varied to a third intensity range after the CVD film grows so that a peak temperature of the CVD film falls as a result of an increase in the heat capacity of the CVD film being grown. The third intensity range should be higher than the second intensity range and lower than an intensity at which the CVD film evaporates while being grown. Summarizing, the optical intensity is controlled during deposition of the CVD film to a range determined by the thickness of the CVD film being grown.

REFERENCES:
patent: 4612085 (1986-09-01), Jelks et al.
Andreatta et al., "Appl. Phys. Lett." vol. 40, No. 2 (15 Jan., 1982) pp. 183-185.

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