Optical arrangement and illumination method

Details Optical arrangement and illumination method Optical arrangement and illumination method

1996-03-22

1998-10-20

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378145, 378 84, G21K 500

Patent

active

058258442

ABSTRACT:
An X-ray optical apparatus includes a mirror element for reflecting an X-ray beam and a mechanism for applying vibrations of a predetermined excitation frequency to the mirror element to produce elastic vibrations to cause deformation of the surface of the mirror element. An illumination method and a device manufacturing method utilize such an X-ray optical apparatus for irradiating an object to be illuminated, such as a mask and a wafer, with the reflected X-ray beam, so that a pattern of the mask is transferred to the wafer.

REFERENCES:
patent: 5123036 (1992-06-01), Uno et al.
patent: 5125014 (1992-06-01), Watanabe et al.
patent: 5394451 (1995-02-01), Miyake et al.
patent: 5444753 (1995-08-01), Hayashida et al.
patent: 5461657 (1995-10-01), Hayashida et al.

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