Optical apparatus for use in photolithography

Details Optical apparatus for use in photolithography Optical apparatus for use in photolithography

2003-12-18

2011-12-06

Sugarman, Scott J (Department: 2873)

Optical: systems and elements

Lens

With support

C359S819000, C359S821000

Reexamination Certificate

active

08072700

ABSTRACT:
An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from the interchange mechanism which facilitates exchange of one for another in the beam path. To reduce transmission of vibration from the interchange mechanism to the optical assembly, the interchange mechanism is mounted on a structure which is substantially dynamically decoupled from the housing, and a selected selectable optical element is located at an operating position at which it is separate from the interchange mechanism.

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