Data processing: measuring – calibrating – or testing – Measurement system – Performance or efficiency evaluation
Reexamination Certificate
2006-05-30
2006-05-30
Assouad, Patrick J. (Department: 2857)
Data processing: measuring, calibrating, or testing
Measurement system
Performance or efficiency evaluation
C702S179000, C700S108000, C700S121000
Reexamination Certificate
active
07054786
ABSTRACT:
In an operation monitoring method according to the present invention, operation data of a plasma processing system (1) are detected for every wafer (W) by means of a plurality of detectors, and a principal component analysis using the operation data is carried out by means of a controller (10). An operation state of the plasma processing system (1) is evaluated by using the results of the principal component analysis.
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Sakano Shinji
Sendoda Tsuyoshi
Assouad Patrick J.
Smith , Gambrell & Russell, LLP
Tokyo Electron Limited
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