Open pattern inductor

Inductor devices – Coil or coil turn supports or spacers – Printed circuit-type coil

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C336S223000, C336S232000, C029S602100, C029S607000

Reexamination Certificate

active

08009006

ABSTRACT:
Various embodiments includes a stacked open pattern inductor fabricated above a semiconductor substrate. The stacked open pattern inductor includes a plurality of parallel open conducting patterns embedded in a magnetic oxide or in an insulator and a magnetic material. Embedding the stacked open pattern inductor in a magnetic oxide or in an insulator and a magnetic material increases the inductance of the inductor and allows the magnetic flux to be confined to the area of the inductor. A layer of magnetic material may be located above the inductor and below the inductor to confine electronic noise generated in the stacked open pattern inductor to the area occupied by the inductor. The stacked open pattern inductor may be fabricated using conventional integrated circuit manufacturing processes, and the inductor may be used in connection with computer systems.

REFERENCES:
patent: 3765082 (1973-10-01), Zyetz
patent: 3785046 (1974-01-01), Jennings
patent: 3798059 (1974-03-01), Astle et al.
patent: 3812442 (1974-05-01), Muckelroy
patent: 4543553 (1985-09-01), Mandai et al.
patent: 4689594 (1987-08-01), Kawabata et al.
patent: 4959631 (1990-09-01), Hasegawa et al.
patent: 5032815 (1991-07-01), Kobayashi et al.
patent: 5070317 (1991-12-01), Bhagat
patent: 5095357 (1992-03-01), Andoh et al.
patent: 5122227 (1992-06-01), Ott
patent: 5227659 (1993-07-01), Hubbard
patent: 5302932 (1994-04-01), Person et al.
patent: 5349743 (1994-09-01), Grader et al.
patent: 5370766 (1994-12-01), Desaigoudar et al.
patent: 5387551 (1995-02-01), Mizoguchi et al.
patent: 5476728 (1995-12-01), Nakano et al.
patent: 5583424 (1996-12-01), Sato et al.
patent: 5583474 (1996-12-01), Mizoguchi et al.
patent: 5602517 (1997-02-01), Kaneko et al.
patent: 5610433 (1997-03-01), Merrill et al.
patent: 5612660 (1997-03-01), Takimoto
patent: 5643804 (1997-07-01), Arai et al.
patent: 5656101 (1997-08-01), Hayakawa et al.
patent: 5788854 (1998-08-01), Desaigoudar et al.
patent: 5801521 (1998-09-01), Mizoguchi et al.
patent: 5821846 (1998-10-01), Leigh et al.
patent: 5831331 (1998-11-01), Lee
patent: 5844451 (1998-12-01), Murphy
patent: 5945902 (1999-08-01), Lipkes et al.
patent: 6052790 (2000-04-01), Brown
patent: 6107907 (2000-08-01), Leigh et al.
patent: 6233834 (2001-05-01), Walsh
patent: 6320376 (2001-11-01), Tamaki et al.
patent: 6326314 (2001-12-01), Merrill et al.
patent: 6356181 (2002-03-01), Kitamura
patent: 6404317 (2002-06-01), Mizoguchi et al.
patent: 6429632 (2002-08-01), Forbes et al.
patent: 6448879 (2002-09-01), Kitamura
patent: 6566731 (2003-05-01), Ahn et al.
patent: 6653196 (2003-11-01), Ahn et al.
patent: 7091575 (2006-08-01), Ahn et al.
patent: 7262482 (2007-08-01), Ahn et al.
patent: 7380328 (2008-06-01), Ahn et al.
patent: 2006/0012007 (2006-01-01), Ahn et al.
patent: 09-246806 (1997-09-01), None
American Society for Metals, “Metals Handbook”,Desk Edition, Second Edition, Metals Park, Ohio: American Society for Metals, (1998), 642-643.
Dhara, S, et al., “Direct Deposit of highly coercive gamma iron oxide thin films for magnetic recording”,Journal of Applied Physics, 74(11), (Dec. 1993), 7019-7021.
Dimitrov, D. V., et al., “Stoichiometry and Magnetic Properties of Iron Oxide Films”,Materials Research Society Symposium Proceedings, 494, (1998), pp. 89-94.
Domke, M., et al., “Magnetic and electronic properties of thin iron oxide films”,Surface Science, 126, (Mar. 1983), pp. 727-732.
Fujii, E, et al, “Low-temperature preparation and properties of spinel-type iron oxide films by ECR plasma-enhanced metalorganic chemical vapor deposition”,Japanese Journal of Applied Physics, 32(10B) (Oct. 1993), pp. 1527-1529.
Itoh, T., et al., “Ferrite plating Ba-containing iron oxide films using chelated highly alkaline (pH equals 11-13) aqueous solutions”,Japanese Journal of Applied Physics,34(3), (Mar. 1995), pp. 1534-1536.
Joshi, S., et al., “Pulsed laser deposition of iron oxide and ferrite films”,Journal of Applied Physics, 64(10), Abstract—Fourth Joint Magnetism and Magnetic Materials—Intermag Conference Vancouver, BC, (Nov. 15, 1988), 5647-5649.
Kaito, C., et al., “Structure of iron oxide films prepared by evaporating various iron oxide powders”,Applications of Surface Science, 22/23, North-Holland, Amsterdam, (1985), pp. 621-630.
Kim, Y J., et al., “Surface Micromachined Solenoid Inductors for High Frequency Applications”,1997 International Symposium on Microelectronics, (1997), 1-6.
Li, J. L., et al., “Preparation of amorphous iron-containing and crystalline iron oxide films by glow discharge and their properties”,Material Science&Engineering, B7, (Sep. 1990), pp. 5-13.
Lin, J. K., et al., “Properties of RF Sputtered Iron Oxide Thin Films with CoCr and Nb as Dopants”,IEEE Transactions on Magnetics, vol. Mag-21, No. 5 (Sep. 1985), 1-3 p.
Macchesney, J. B., et al., “Chemical vapor deposition of iron oxide films for use as semitransparent masks”,Journal of the Electrochemical Society, 118(5), (May 1971), pp. 776-781.
Ouchi, H., et al., “High rate deposition of iron-oxide thin films by reactive sputtering”,IEEE Transactions on Magnetics, vol. Mag-19, No. 5, (Sep. 1983) , pp. 1980-1982.
Ouyang, M., et al., “Structure and Magnetic Properties of Iron Oxide Films Deposited by Excimer Laser Ablation of a Metal-Containing Polymer”,Material Research Bulletin, 32(8), (1997), pp. 1099-1107.
Park, J. Y., et al., “Ferrite-Based Integrated Planar Inductor and Transformers Fabricated at Low Temperature”,IEEE Transactions on Magnetics, 33(5), (Sep. 1997), pp. 3322-3324.
Park, J. Y., et al., “Fully Integrated Micromachined Inductors with Electroplated Anisotropic Magnetic Cores”,Thirteenth Annual Applied Power Electronics Conference and Exposition, vol. 1, Conference Proceedings, Anaheim, California, (1998), 379-385.
Shigematsu, T., et al., “Magnetic properties of amorphous iron (III) oxide thin films”,Journal de Physique Colloque, International Conference on the Applications of the Mossbauer Effect, Kyoto, Japan, (Mar. 1979), pp. 153-154.
Zheng, Y., et al., “Structure and magnetic properties of sputtered iron oxide films”,Proceedings of the International Symposium on Physics of Magnetic Materials, , (1987), pp. 146-149.
Zuffada, C., et al., “Modeling Radiation with an Efficient Hybrid Finite-Element Integral-Equation Waveguide Mode-Matching Technique”,Antennas and Propagation, IEEE, 45 (1), (Jan. 1997), 34-39.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Open pattern inductor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Open pattern inductor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Open pattern inductor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2726294

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.