Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2011-01-04
2011-01-04
Dinh, Paul (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000, C716S030000
Reexamination Certificate
active
07865863
ABSTRACT:
An integrated circuit verification system provides an indication of conflicts between an OPC suggested correction and a manufacturing rule. The indication specifies which edge segments are in conflict so that a user may remove the conflict to achieve a better OPC result. In another embodiment of the invention, edge segments are assigned a priority such that the correction of a lower priority edge does not hinder a desired OPC correction of a higher priority edge.
REFERENCES:
patent: 4532650 (1985-07-01), Wihl et al.
patent: 4762396 (1988-08-01), Dumant et al.
patent: 5297150 (1994-03-01), Clark
patent: 5396584 (1995-03-01), Lee et al.
patent: 5473748 (1995-12-01), Date et al.
patent: 5502654 (1996-03-01), Sawahata
patent: 5655110 (1997-08-01), Krivokapic et al.
patent: 5723233 (1998-03-01), Garza et al.
patent: 5815685 (1998-09-01), Kamon
patent: 5825647 (1998-10-01), Tsudaka
patent: 5879844 (1999-03-01), Yamamoto et al.
patent: 5991006 (1999-11-01), Tsudaka
patent: 6016357 (2000-01-01), Neary et al.
patent: 6033814 (2000-03-01), Burdorf et al.
patent: 6042257 (2000-03-01), Tsudaka
patent: 6049660 (2000-04-01), Ahn et al.
patent: 6077310 (2000-06-01), Yamamoto et al.
patent: 6080527 (2000-06-01), Huang et al.
patent: 6120952 (2000-09-01), Pierrat et al.
patent: 6128067 (2000-10-01), Hashimoto
patent: 6187483 (2001-02-01), Capodieci et al.
patent: 6243855 (2001-06-01), Kobayashi et al.
patent: 6249904 (2001-06-01), Cobb
patent: 6263299 (2001-07-01), Aleshin et al.
patent: 6269472 (2001-07-01), Garza et al.
patent: 6301697 (2001-10-01), Cobb
patent: 6317859 (2001-11-01), Papadopoulou
patent: 6370679 (2002-04-01), Chang et al.
patent: 6425117 (2002-07-01), Pasch et al.
patent: 6430737 (2002-08-01), Cobb et al.
patent: 6453452 (2002-09-01), Chang et al.
patent: 6453457 (2002-09-01), Pierrat et al.
patent: 6467076 (2002-10-01), Cobb
patent: 6470489 (2002-10-01), Chang et al.
patent: 6499003 (2002-12-01), Jones et al.
patent: 6574784 (2003-06-01), Lippincott et al.
patent: 6643616 (2003-11-01), Granik et al.
patent: 6649309 (2003-11-01), Mukherjee
patent: 6665845 (2003-12-01), Aingaran et al.
patent: 6668367 (2003-12-01), Cobb et al.
patent: 6704921 (2004-03-01), Liu
patent: 6748578 (2004-06-01), Cobb
patent: 6792590 (2004-09-01), Pierrat et al.
patent: 6817003 (2004-11-01), Lippincott et al.
patent: 6857109 (2005-02-01), Lippincott
patent: 6887633 (2005-05-01), Tang
patent: 6899981 (2005-05-01), Galan et al.
patent: 6928634 (2005-08-01), Granik et al.
patent: 6973633 (2005-12-01), Lippincott et al.
patent: 7010776 (2006-03-01), Gallatin et al.
patent: 7013439 (2006-03-01), Robles et al.
patent: 7017141 (2006-03-01), Anderson et al.
patent: 7024655 (2006-04-01), Cobb
patent: 7028284 (2006-04-01), Cobb et al.
patent: 7047516 (2006-05-01), Futatsuya
patent: 7062748 (2006-06-01), Mellmann
patent: 7073162 (2006-07-01), Cobb et al.
patent: 7155689 (2006-12-01), Pierrat et al.
patent: 7155699 (2006-12-01), Cobb
patent: 7172838 (2007-02-01), Maurer et al.
patent: 7181721 (2007-02-01), Lippincott et al.
patent: 7237221 (2007-06-01), Granik et al.
patent: 7240305 (2007-07-01), Lippincott
patent: 7240321 (2007-07-01), Cobb et al.
patent: 7281234 (2007-10-01), Lippincott
patent: 7293249 (2007-11-01), Torres Robles et al.
patent: 7324930 (2008-01-01), Cobb
patent: 7367009 (2008-04-01), Cobb et al.
patent: 2002/0140920 (2002-10-01), Rosenbluth et al.
patent: 2004/0063000 (2004-04-01), Maurer et al.
patent: 2004/0133871 (2004-07-01), Granik et al.
patent: 2005/0076316 (2005-04-01), Pierrat et al.
patent: 2005/0149901 (2005-07-01), Tang
patent: 2005/0229130 (2005-10-01), Wu et al.
patent: 2005/0229131 (2005-10-01), Wu et al.
patent: 2005/0251771 (2005-11-01), Robles
patent: 2005/0273733 (2005-12-01), Lippincott
patent: 2005/0278686 (2005-12-01), Word et al.
patent: 2006/0188796 (2006-08-01), Word
patent: 2006/0199084 (2006-09-01), Word
patent: 2006/0200790 (2006-09-01), Shang et al.
patent: 2006/0240342 (2006-10-01), Tang
patent: 2007/0074143 (2007-03-01), Cobb et al.
patent: 2007/0118826 (2007-05-01), Lippincott
patent: 2007/0124708 (2007-05-01), Torres Robles et al.
patent: 2008/0141195 (2008-06-01), Torres Robles et al.
patent: 09319067 (1997-12-01), None
patent: 11-102380 (1999-04-01), None
patent: 2004-502961 (2004-01-01), None
patent: WO 99/14637 (1999-03-01), None
patent: WO 99/14638 (1999-03-01), None
patent: WO 01/65315 (2001-09-01), None
patent: WO 01/97096 (2001-12-01), None
Adam et al., “Improved Modeling Performance with an Adapted Vectorial Formulation of the Hopkins imaging Equation,”Proceedings of SPIE: Optical Microlithography XVI, vol. 5040, pp. 78-91 (Feb. 25, 2003).
Cobb et al., “New Concepts in OPC,”Proceedings of SPIE: Optical Microlithography XVII, vol. 5377, pp. 680-690 (Feb. 24, 2004).
Cobb et al., “OPC Methods to Improve Image Slope and Process Window,”Proceedings of SPIE: Design and Process Integration for Microelectronic Manufacturing, vol. 5042, pp. 116-125 (Feb. 27, 2003).
Granik, “New Process Models for OPC at sub-90nm Nodes,”Proceedings of SPIE: Optical Microlithography XVI, vol. 5040, pp. 1166-1175 (Feb. 25, 2003).
Granik et al., “Universal process modeling with VTRE for OPC,”Proceedings of SPIE: Optical Microlithography XV, vol. 4691, pp. 377-394 (Mar. 5, 2002).
Schellenberg, “Sub-Wavelength Lithography Using OPC,”Semiconductor Fabtech, 9th ed., pp. 205-209 (Mar. 1999).
Cobb, N., and Y. Granik, “Model-Based OPC Using the MEEF Matrix,”Proceedings of SPIE, vol. 4889: 22nd Annual BACUS Symposium on Photomask Technology, Monterey, Calif., Sep. 30-Oct. 4, 2002, p. 147.
Cobb, N., and A. Zakhor, “Experimental Results on Optical Proximity Correction With Variable Threshold Resist Model,”Proceedings of SPIE, vol. 3051: Symposium on Optical Microlithography X, Santa Clara, Calif., Mar. 10-14, 1997, pp. 458-468.
Cobb, N., and A. Zakhor, “Fast, Low-Complexity Mask Design,”Proceedings of SPIE, vol. 2440: Symposium on Optical/Laser Microlithography VIII, Santa Clara, Calif, Feb. 22-24, 1995, pp. 313-327.
Cobb, N., and A. Zakhor, “Fast Sparse Aerial Image Calculation for OPC,”Proceedings of SPIE, vol. 2621: 15th Annual BACUS Symposium on Photomask Technology and Management, Santa Clara, Calif., Sep. 20-22, 1995, pp. 534-545.
Cobb, N., and A. Zakhor, “Large Area Phase-Shift Mask Design,”Proceedings of SPIE, vol. 2197: Symposium on Optical/Laser Microlithography VII, San Jose, Calif., Mar. 2-4, 1994, pp. 348-360.
Cobb., N., et al., “Mathematical and CAD Framework for Proximity Correction,”Proceedings of SPIE, vol. 2726: Symposium on Optical Microlithography IX, Santa Clara, Calif., Mar. 13-15, 1996, pp. 208-222.
Cobb, N., and Y. Granik, “Using OPC to Optimize for Image Slope and Improve Process Window,” (Nov. 20, 2002),Proceedings of SPIE, vol. 5130: Photomask Japan, Yokohama, Japan, Apr. 16-18, 2003, p. 42.
Granik, Y., “Generalized MEEF Theory,”Interface 2001, Nov. 2001.
Granik, Y., and N. Cobb, “MEEF as a Matrix,”Proceedings of SPIE, vol. 4562: 21st Annual BACUS Symposium on Photomask Technology, Monterey, Calif., Oct. 2-5, 2001, pp. 980-991.
Granik, Y., and N. Cobb, “Two-Dimensional G-MEEF Theory and Applications,”Proceedings of SPIE, vol. 4754: Symposium on Photomask and Next-Generation Lithography Mask Technology IX, Yokohama, Japan, Apr. 23-25, 2002, pp. 146-155.
Maurer, W., et al., “Process Proximity Correction Using an Automated Software Tool,”Proceedings of SPIE, vol. 3334: Optical Microlithography XI, Santa Clara, Calif, Feb. 22-27, 1998, pp. 245-253.
Maurer, W., et al., “Evaluation of a Fast and Flexible OPC Package: Optissimo,”Proceedings of SPIE, vol. 2884: 16th Annual Symposium on Photomask Technology and Management, Redwood City, Calif., Sep. 18-20, 1996, pp. 412-418.
Mentor Graphics Corporation, News & Views, Mar. 1999, <http://www.mentorg.co.jp/N-V/99—3/dsm.html> [retrieved Nov. 7, 2006].
Mento
Dinh Paul
Klarquist & Sparkman, LLP
Mentor Graphics Corporation
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