Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-01-11
2005-01-11
Thornton, Yvette C. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S286100, C430S905000, C430S914000, C522S061000, C568S013000
Reexamination Certificate
active
06841334
ABSTRACT:
Disclosed are novel onium salts represented by general formula (R)3S+M, wherein three R's may be the same or different, each being an aryl group, provided that at least one of R's is a t-alkoxy substituted phenyl group, and M is an anion capable of forming the sulfonium salts; and high energy radiation-responsive positive resist materials using said novel onium salts as acid generator.
REFERENCES:
patent: 2833827 (1958-05-01), Hahn et al.
patent: 3723534 (1973-03-01), Ratts
patent: 4256828 (1981-03-01), Smith
patent: 5164278 (1992-11-01), Brunsvold et al.
patent: 5220037 (1993-06-01), Schwalm et al.
patent: 5314929 (1994-05-01), Crivello et al.
patent: 5346803 (1994-09-01), Crivello et al.
patent: 5580695 (1996-12-01), Murata et al.
patent: 5612170 (1997-03-01), Takemura et al.
patent: 5624787 (1997-04-01), Watanabe et al.
patent: 5691112 (1997-11-01), Watanabe et al.
patent: 6613844 (2003-09-01), Watanabe et al.
patent: 05-20265 (1992-12-01), None
patent: 523957 (1993-01-01), None
patent: 61-12725 (1986-01-01), None
patent: 63-223002 (1988-09-01), None
Furihata Tomoyoshi
Kawai Yoshio
Matsuda Tadahito
Tanaka Akinobu
Watanabe Jun
Millen White Zelano & Branigan P.C.
Nippon Telegraph and Telephone Corporation
Shin-Etsu Chemical Co. , Ltd.
Thornton Yvette C.
LandOfFree
Onium salts and positive resist materials using the same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Onium salts and positive resist materials using the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Onium salts and positive resist materials using the same will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3419650