Onium salt compound and radiation-sensitive resin composition

Details Onium salt compound and radiation-sensitive resin composition Onium salt compound and radiation-sensitive resin composition

2007-05-15

2007-05-15

Schilling, Richard L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S914000, C430S921000, C522S031000, C564S084000, C564S092000, C564S095000, C564S099000, C568S030000, C568S034000, C568S035000

Reexamination Certificate

active

10743809

ABSTRACT:
An onium salt compound having a cation moiety of the following formula (1) is disclosed.wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1–10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.

REFERENCES:
patent: 4374066 (1983-02-01), Crivello et al.
patent: 59-45439 (1984-03-01), None
patent: 63-36332 (1988-02-01), None
patent: 08027209 (1996-01-01), None
patent: 2003307839 (2003-10-01), None
CA abstract DN 124:292462, JP 8-27209, Jan. 1996.
CA abstract DN 139-343479, JP 2003-307839, Oct. 2003.
Crivello, et al., “Complex Triarylsulfonium Salt Photoinitiators. II. The Preparation of Several New Complex Triarylsulfonium Salts and the Influence of Their Structure in Photoinitiated Cationic Polymerization”, Journal of Polymer Science, vol. 18, pp. 2697-2714, 1980.
Hattori, et al., “Successive Beckmann Rearrangement-Alkylation Sequence by Organoaluminum Reagents. A Simple Route todl-Pumiliotoxin C”, J. Am. Chem. Soc., vol. 103, pp. 7368-7370, 1981.
Alemagna, et al., “SNAr Nucleophilic Substitutions of Cr(CO)3-Complexed Aryl Halides with Thiolates under Phase-Transfer Conditions”, J. Org. Chem., vol. 48, pp. 605-607, 1983.
Migita, et al., “The Palladium Catalyzed Nucleophilic Substitution of Aryl Halides by Thiolate Anions”, Bull. Chem. Soc. Jpn., vol. 53, pp. 1385-1389, 1980.

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