One-bath etching method for processing gravure plate, and etchin

Details One-bath etching method for processing gravure plate, and etchin One-bath etching method for processing gravure plate, and etchin

1982-11-26

1983-12-13

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 156905, B41C 100

Patent

active

044203632

ABSTRACT:
In a one-bath etching process in which gravure cells are formed in the surface of a gravure cylinder with one kind of etching solution having a predetermined density, in order to control the cell depths by suitably selecting the cylinder speed, data is provided by correlating a permeation characteristic which is obtained by an inspecting solution substantially similar in characteristic to the etching solution to that which is obtained by the etching solution, while data is obtained by correlating to cylinder speeds, and these data are compared with data which are obtained from the resist layer of the cylinder which is to be used for printing, to determine the total etching time and the cylinder speeds.

REFERENCES:
patent: 3496046 (1970-02-01), Lootvoet

Affiliated with

Also associated with

Rating

One-bath etching method for processing gravure plate, and etchin does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with One-bath etching method for processing gravure plate, and etchin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and One-bath etching method for processing gravure plate, and etchin will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-803413