On-site ammonia purification for semiconductor manufacture

Details On-site ammonia purification for semiconductor manufacture On-site ammonia purification for semiconductor manufacture

1996-07-01

1998-12-08

Bhat, Nina

Distillation: processes, separatory

Distilling to separate or remove only water

From nitric acid

203 40, 423484, 423488, 202158, 202161, 202172, 202200, C01B 2144, B01D 300

Patent

active

058463860

ABSTRACT:
Highly purified ammonia for use in semiconductor manufacturing is prepared on-site by drawing ammonia vapor from a liquid ammonia reservoir, passing the vapor through a filter capable of filtering out particles of less than 0.005 micron in size, and scrubbing the filtered vapor in a high-pH aqueous scrubber.

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patent: 4929435 (1990-05-01), Boghean et al.
patent: 4952386 (1990-08-01), Davidson et al.
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patent: 5164049 (1992-11-01), Clark et al.
patent: 5242468 (1993-09-01), Clark et al.
patent: 5288333 (1994-02-01), Tanaka et al.
patent: 5346557 (1994-09-01), Ito et al.
patent: 5496778 (1996-03-01), Hoffman et al.
patent: 5500098 (1996-03-01), Brown et al.

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