Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1995-09-21
1997-03-04
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430302, 4302781, 4302811, 101451, 101456, G03F 730
Patent
active
056078161
ABSTRACT:
Described is the use of a plasticizing-permeation enhancing additive in negative-working, on-press developable lithographic printing plates. Briefly, a plasticizer, which is dispersible or soluble in press fountain and ink solutions and soluble in acrylic monomers and oligomers, are incorporated into a plate's photoresist at concentrations sufficient to enhance said resist's permeability to or diffusion by press solutions. Such additives make the photoresist more permeable to fountain solution prior to crosslinking, while being easily extracted with ink and fountain solution after crosslinking. In certain embodiments, a surfactant is added to facilitate the dispersion of hydrophobic remnants of removed resist material in the fountain solution, and thereby reduce scumming. Lithium salts may also be incorporated into the photoresist to disrupt hydrogen bonding of, for example, urethane acrylate polymers which tend to associate by hydrogen bonding.
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Fitzgerald Maurice J.
Hardin John M.
Kearney Frederick R.
Liang Rong-Chang
de Luna Renato M.
Hamilton Cynthia
Polaroid Corporation
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