Oligomeric compounds with acid-labile protective groups useful i

Details Oligomeric compounds with acid-labile protective groups useful i Oligomeric compounds with acid-labile protective groups useful i

1992-07-28

1994-10-11

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, G03C 1492

Patent

active

053546431

ABSTRACT:
Disclosed are compounds of the formula I ##STR1## in which X is a phenyl, [1]naphthyl or [2]naphthyl radical each substituted by at least one tert.-butoxycarbonyloxy group and, if appropriate, having one or more than one additional substituent,

REFERENCES:
patent: 4248957 (1981-02-01), Sander et al.
patent: 5069997 (1991-12-01), Schwalm et al.
Willson, "Organic Resist Materials--Theory and Chemistry" [Introduction to Microlithography, Theory Materials, and Processing, Thompson et al., ACS Symp. Ser., Mar. 1983, vol. 219, pp. 87-159.]

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