Off-axis magnetron sputter deposition of mirrors

Details Off-axis magnetron sputter deposition of mirrors Off-axis magnetron sputter deposition of mirrors

1992-12-04

1994-07-12

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429811, 20429815, 20429826, 20429827, C23C 1434

Patent

active

053285824

ABSTRACT:
A magnetron sputtering apparatus can be used to achieve high quality coating on substrates if the substrates are positioned adjacent to the sputtering target. Furthermore, the coating can be enhanced if the substrate is rotated in a planetary manner about the sputtering target. This device can be used in the production of high quality mirrors if the device allows for alternating coatings of different materials.

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