Observing method and its apparatus using electron microscope

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Reexamination Certificate

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C250S311000, C250S492100

Reexamination Certificate

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07598491

ABSTRACT:
The present invention relates to high-speed acquisition of both a perpendicular observation image and a tilt observation image, in observation using a scanning electron microscope. An electron-beam observation apparatus includes: a first electro-optical system which scans a converged electron beam from a substantially perpendicular direction to a defect on a target wafer to be observed, and acquires a defect image signal with perpendicular observation by detecting a secondary electron image or a reflected electron image generated from the defect; and a second electro-optical system which scans a converged electron beam from a tilt direction to the defect, and acquires a defect image signal with tilt observation by detecting a secondary electron image or a reflected electron image generated from the defect.

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patent: 2004/0235205 (2004-11-01), Levy et al.
patent: 2000-021345 (2000-01-01), None
patent: 2004-219343 (2004-08-01), None

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