Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With measuring – sensing – detection or process control means
Reexamination Certificate
2007-02-06
2007-02-06
Kackar, Ram N. (Department: 1763)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With measuring, sensing, detection or process control means
C156S345250, C156S345270, C118S712000, C204S192130, C204S192330, C204S298030, C204S298330
Reexamination Certificate
active
10742779
ABSTRACT:
An observation window airtightly installed at a wall of a processing room of a plasma processing apparatus includes a body having a through hole with an opening facing the processing room, a transparent member installed at a side of the body opposite to the processing room and a magnetic pole pair having two different magnetic poles disposed opposite each other with the hole interposed therebetween. The magnetic pole pair is configured to have a sufficient magnetic field strength to prevent electrons which form a plasma in the processing room from reaching the transparent member through the hole.
REFERENCES:
patent: 6390019 (2002-05-01), Grimbergen et al.
patent: 6427621 (2002-08-01), Ikegawa et al.
patent: 6503364 (2003-01-01), Masuda et al.
patent: 6712927 (2004-03-01), Grimbergen et al.
patent: 6831742 (2004-12-01), Sui et al.
patent: 09186089 (1997-07-01), None
Kackar Ram N.
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Tokyo Electron Limited
LandOfFree
Observation window of plasma processing apparatus and plasma... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Observation window of plasma processing apparatus and plasma..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Observation window of plasma processing apparatus and plasma... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3813850