Optical: systems and elements – Lens – With field curvature shaping
Reexamination Certificate
2008-09-23
2008-09-23
Choi, William C (Department: 2873)
Optical: systems and elements
Lens
With field curvature shaping
C359S665000
Reexamination Certificate
active
11758363
ABSTRACT:
The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nLand at least one liquid lens (F) made from a transparent liquid, with a refractive index nF. At the operating wavelength the first lens has the greatest refractive index nLof all solid lenses of the objective, the refractive index nFof the at least one liquid lens (F) is bigger than the refractive index nLof the first lens and the value of the numerical aperture NA is bigger than 1.
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Beder Susanne
Schuster Karl-Heinz
Shafer David R.
Singer Wolfgang
Carl Zeiss SMT AG
Choi William C
Fish & Richardson P.C.
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