Objective with pupil obscuration

Details Objective with pupil obscuration Objective with pupil obscuration

2007-04-24

2007-04-24

Nguyen, Thong Q (Department: 2872)

Optical: systems and elements

Compound lens system

With curved reflective imaging element

C359S362000, C359S858000, C355S071000

Reexamination Certificate

active

11102524

ABSTRACT:
In accordance with the present invention, a projection exposure apparatus includes an illuminating system to illuminate a drivable micromirror array and an objective which projects the drivable micromirror array onto the photosensitive substrate. The objective includes mirrors which are arranged coaxial with respect to a common optical axis. The objective can be a catoptric objective and can have a numerical aperture at the substrate greater than 0.1 and can have an imaging scale ratio of greater than 20:1. The objective can also include at least two partial objectives with an intermediate image plane between the at least two partial objectives and can consist of mirrors that are coated with reflecting layers which are adapted to reflect two mutually separated operating wavelengths.

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