Object processing apparatus and plasma facility comprising...

Details Object processing apparatus and plasma facility comprising... Object processing apparatus and plasma facility comprising...

2008-05-27

2008-05-27

Mayekar, Kishor (Department: 1795)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

With means applying electromagnetic wave energy or...

Reexamination Certificate

active

10276301

ABSTRACT:
A processing apparatus for subject of the present invention uses a high voltage electrode and a ground electrode, and generates plasma under atmospheric pressure in a reaction passage through which a to-be-processed subject passes. For example, even fluorocompound such as PFC including CF4can effectively be decomposed because the fluorocompound is brought into contact with plasma in a small space for sufficient time, and the apparatus has a small and simple structure. Therefore, the apparatus can be added to each process chamber.

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International Search Report for corresponding patent application No. PCT/JP01/04437 dated Sep. 4, 2001.

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