O-naphthoquinone diazide photosensitive coating composition cont

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430165, 430192, G03F 7023, G03C 161

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active

053188748

ABSTRACT:
A composition for forming a photosensitive coating is disclosed which includes:

REFERENCES:
patent: 4076537 (1978-02-01), Tsaboi
patent: 4632891 (1986-12-01), Banks et al.
Patent Abstracts of Japan, vol. 11, No. 32 (P541) Jan. 1987.
Patent Abstracts of Japan, vol. 6, No. 88 (P-118) May, 1982.
Patent Abstracts of Japan, vol. 14, No. 233 (P-1049) May 1990.

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