Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2006-07-18
2006-07-18
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C427S536000, C427S539000, C427S322000
Reexamination Certificate
active
07077935
ABSTRACT:
O2and H2O barrier materials suitable for the protection of LCDs and flexible OLEDs are fabricated on a polymer substrate using dense inorganic barrier layers. A polymer surface having a low surface roughness has an inorganic layer of aluminum or silicon oxides deposited thereupon using ion-assisted vacuum deposition with an argon ion gun, which treatment surprisingly provides a smoothing effect on the surface of the polymer. By pretreatment of prefabricated polymeric film with ion-gun enhanced plasma in the presence of oxygen, commercially available heat-stabilized PET and PEN films can be directly employed as substrates. Protective polymer layers are optionally coated upon the thin inorganic barrier layer.
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Machine Translation of 05-295528.
International Search Report for International Application No. PCT/US02/14218, issued on Nov. 14, 2002.
Piner John R.
Ziegler John P.
Fitch Even Tabin & Flannery
General Atomics
McDonald Rodney G.
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