Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2006-10-10
2006-10-10
Chaudhari, Chandra (Department: 2891)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257SE27103
Reexamination Certificate
active
07119396
ABSTRACT:
A method of forming a memory device (and the resulting device) by forming an electron trapping dielectric material over a substrate, forming conductive material over the dielectric material, forming a spacer of material over the conductive material, removing portions of the dielectric material and the conductive material to form segments thereof disposed underneath the spacer of material, forming first and second spaced-apart regions in the substrate having a second conductivity type different from that of the substrate, with a channel region extending between the first and second regions, with the segments of the dielectric and first conductive materials being disposed over a first portion of the channel region for controlling a conductivity thereof, and forming a second conductive material over and insulated from a second portion of the channel region for controlling a conductivity thereof.
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patent: 6853587 (2005-02-01), Forbes
patent: 2003/0235076 (2003-12-01), Forbes
Chen Bomy
Hu Yaw Wen
Lee Dana
Yeh Bing
Chaudhari Chandra
DLA Piper Rudnick Gray Cary US LLP
Silicon Storage Technology, Inc.
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