Novel etching composition and method for using same

Details Novel etching composition and method for using same Novel etching composition and method for using same

1976-06-29

1978-03-21

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156659, 156665, 156904, 252 792, 252 794, 427250, C23F 102

Patent

active

040802469

ABSTRACT:
An improved etchant solution for selectively etching unprotected areas of metal film from a substrate which comprises between about 65 and about 90 parts by weight phosphoric acid, between about 0.5 and about 5 parts by weight of a perchloric acid component and between about 9 and about 30 parts by weight water, which composition contains from 0 to about 5% by weight total volume of a neutral or anionic wetting agent. The invention also comprises the method of utilizing the etchant composition and the improved precision device produced thereby.

REFERENCES:
patent: 3202612 (1965-08-01), Nelson
patent: 3715250 (1973-02-01), Altman et al.
patent: 3833434 (1974-09-01), Kikuchi et al.
patent: 3905907 (1975-09-01), Shiga
patent: 3953263 (1976-04-01), Ishikawa et al.

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