X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1987-08-05
1990-04-10
Fields, Carolyn E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 49, 378 82, G21K 106
Patent
active
049167219
ABSTRACT:
A non-planar, focusing mirror, to be utilized in both electron column instruments and micro-x-ray fluorescence instruments for performing chemical microanalysis on a sample, comprises a concave, generally spherical base substrate and a predetermined number of alternating layers of high atomic number material and low atomic number material contiguously formed on the base substrate. The thickness of each layer is an integral multiple of the wavelength being reflected and may vary non-uniformly according to a predetermined design. The chemical analytical instruments in which the mirror is used also include a predetermined energy source for directing energy onto the sample and a detector for receiving and detecting the x-rays emitted from the sample; the non-planar mirror is located between the sample and detector and collects the x-rays emitted from the sample at a large solid angle and focuses the collected x-rays to the sample.
For electron column instruments, the wavelengths of interest lie above 1.5 nm, while for x-ray fluorescence instruments, the range of interest is below 0.2 nm. Also, x-ray fluorescence instruments include an additional non-planar focusing mirror, formed in the same manner as the previously described m
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Carr Martin J.
Romig, Jr. Alton D.
Chafin James H.
Daniel Anne D.
Fields Carolyn E.
Moser William R.
Porte David P.
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